Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The content discusses various types of resists used in …
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The content describes the generation of undercut struct…
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The laser ablation of PPA (Phoenix 81) was studied, dem…
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The content discusses laser direct exposure with AR-P 3…
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The post describes two procedures for manufacturing con…
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The new special resist SX AR-N 4810/1 is a chemically a…
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A new high-temperature resistant negative resist, SX AR…
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A negative polyimide photoresist has been developed as …
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The negative two-layer lift-off system offers enhanced …
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In the CiS Institute for Microsensors, a new spray coat…
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This content discusses the use of NIR-laser structurabl…
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The content discusses the one-layer and two-layer lift-…
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The content discusses the challenges of coating Teflon …
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This content discusses the use of two-layer polyimide s…
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Polyimides, produced through a 2-step procedure, are su…
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This content discusses the use of positive resist for t…
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Two positive-tone two-layer lift-off systems, the AR-P …
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The most widely used resists in composition are positiv…
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The content discusses resist for 488 nm exposure wavele…
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A new resist series sensitive to laser exposure in the …
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