Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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Summary: PMMA resist is commonly used for electron beam…
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The negative resist AR-N 4400-10 can be structured with…
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Summary: Allresist offers spray resists suitable for ex…
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The content discusses the use of spray resists for diff…
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Laser ablation involves using laser irradiation to dest…
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The content discusses the structuring of polyphthalalde…
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The SX AR-N 7100 is a negative photoresist system that …
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New aqueous-alkali soluble polymers offer high thermal …
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The Resist Wiki article discusses thermally stable two-…
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The thermostable photoresists, SX AR-N 4340/6 and SX AR…
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The content discusses thermostable photoresists, includ…
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The top surface imaging (TSI) photoresist utilizes sele…
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The top surface imaging (TSI) photoresist technology, b…
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The two-layer photoresist system, consisting of PMMA re…
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A new two-layer resist system has been developed to add…
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The UV-structuring of PMMA resists can be achieved usin…
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Water-based photoresists offer an alternative to tradit…
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Water-based photoresists offer an alternative to tradit…
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