Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
閱讀愉快
The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The two-layer resist AR-BR 5460, with its non-light-sen…
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The post discusses adhesive agents like AR 300-80 and H…
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The novolac-based negative-tone resist offers superior …
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The post discusses the process of obtaining alkali-stab…
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The post discusses the positive resist SX AR-P 5900/8, …
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Aqueous negative resist based on gelatine allows for ph…
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The new Atlas 46 development is suitable for nanoimprin…
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Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10…
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The dyed resists developed in the Photoenco project inv…
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CAR 44 on copper is a negative photoresist that require…
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The content discusses the process parameters and resolu…
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The provided content discusses chemically enhanced nega…
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The content describes coloured negative photoresists us…
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The content discusses the use of chemically enhanced ne…
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The content discusses the dilution of photo resists, pa…
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The size and shape of structures in negative resists ar…
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The structure of the image reversal resist AR-U 4060 pr…
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The study at TU Braunschweig focused on the fabrication…
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The content discusses the use of photoresists to create…