Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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Evaluation of various developers for e-beam exposed CSA…
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Fluorescent e-beam resists, created using PMMA and CSAR…
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When primary electrons collide with other electrons or …
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HF etching of GaAs with CSAR 62 masks Mr. Y. Nori from …
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The company Raith GmbH demonstrated that coating quartz…
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A high-resolution negative e-beam resist with a sensiti…
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A new high-resolution negative e-beam resist, AR-N 7520…
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High-resolution PMMA one layer resist Utilizing SX AR-P…
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Highly sensitive e-beam resist AR-P 617 (PMMA-copolymer…
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The study assessed the long-term stability of Electra 9…
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Manufacture of plasmonic nanostructures with CSAR 62 Bj…
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EUV-lithography (EUVL) uses extreme ultraviolet radiati…
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Medusa 82, a standard resist, can have its sensitivity …
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The Medusa 82 negative resist offers high resolution an…
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Medusa 82’s sensitivity can be increased by adding phot…
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The process for patterning the conductive protective co…
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The Eurostar PPA-Litho project successfully developed t…
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Mr. Chi Tang has been working since 2015 at the Univers…
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PMMA e-beam resist with flat gradation for three-dimens…
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