Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
閱讀愉快
The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
Articles
Content Preview
Categories & Tags
-
The conductivity of resist layers in e-beam lithography…
-
CSAR 62 Avoidance of particles during large-area exposu…
-
CSAR 62 for EUV applications In addition to the use in …
-
CSAR 62 for thick films Intensive plasma etching applic…
-
CSAR 62 lift-off for thick layers For special applicati…
-
CSAR 62 nanostructures written at 100 kV Applying an ac…
-
Use of CSAR 62 for the manufacture of nanostructures on…
-
CSAR 62 single layer lift-off system With our new devel…
-
Thick CSAR 62 A few applications like e.g. the manufact…
-
CSAR 62 thick layers The e-beam resist CSAR 62 has so f…
-
CSAR 62 – Development at low temperatures The sensitivi…
-
CSAR 62 – Experimental studies on new, sensitive develo…
-
CSAR 62 – Mechanism of action By comparison with P…
-
CSAR structures on glass The use of a combination of CS…
-
The e-beam resist AR-N 7720, developed by Allresist, al…
-
Electron beam lithography (EBL) involves both mask-base…
-
Electron beam lithography (EBL) is a significant proced…
-
A variant of Electra 92 is optimized for novolac-based …
-
Electron beam lithography (EBL) systems are composed of…
-
Electron beam lithography (EBL) systems consist of comp…
Techpoint 久理企業 