Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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Fluorescent e-beam resists, created using PMMA and CSAR 62 polymers with fluorescence dyes, exhibit … read 閱讀全文
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The content discusses the use of photoresists to create fluorescent structures with adjustable emiss… read 閱讀全文
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Photoresists used in microelectronics and microsystems technology create µm- and sub-µm structures. … read 閱讀全文
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The content discusses various types of resists used in the fabrication process, including positive a… read 閱讀全文
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When primary electrons collide with other electrons or atoms, they can undergo inelastic scattering,… read 閱讀全文
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The content describes the generation of undercut structures with negative resists using laser direct… read 閱讀全文
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HF etching of GaAs with CSAR 62 masks Mr. Y. Nori from read 閱讀全文
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The company Raith GmbH demonstrated that coating quartz with Electra 92 allows for accurate patterni… read 閱讀全文
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A high-resolution negative e-beam resist with a sensitivity of about 30 nm resolution is urgently re… read 閱讀全文
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A new high-resolution negative e-beam resist, AR-N 7520.17new, has been successfully used at FEMTO-S… read 閱讀全文
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High-resolution PMMA one layer resist Utilizing SX AR-P read 閱讀全文
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Highly sensitive e-beam resist AR-P 617 (PMMA-copolymer read 閱讀全文
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The protective coating SX AR-PC 5000/31 is a hybrid of novolacs and PMMA polymers, providing high re… read 閱讀全文
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Interference lithography Interference lithography is a read 閱讀全文
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The laser ablation of PPA (Phoenix 81) was studied, demonstrating its potential for precise structur… read 閱讀全文
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The content discusses laser direct exposure with AR-P 3540, a technology that allows writing structu… read 閱讀全文
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The post describes two procedures for manufacturing conducting paths: etching technique and lift-off… read 閱讀全文
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The high-energy electrons impacting insulating substrates cause the substrate to charge negatively, … read 閱讀全文
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The study assessed the long-term stability of Electra 92 by coating two reference samples on glass a… read 閱讀全文
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Manufacture of plasmonic nanostructures with CSAR 62 Bj read 閱讀全文
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