標籤: positive-EBL resist

CSAR 62 Avoidance of particles during large-area exposures During the exposure and subsequent develo… read 閱讀全文

CSAR 62 lift-off for thick layers For special applications in which metal layers with a thickness of read 閱讀全文

CSAR 62 thick layers The e-beam resist CSAR 62 has so far been offered in three standard versions:AR… read 閱讀全文

Thick CSAR 62 A few applications like e.g. the manufacture of deep etched structures by plasma etchi… read 閱讀全文

Solvents in e-beam resists The beginning of electron beam lithography dates back to the early 1980s … read 閱讀全文

Collapse of extreme high-resolution e-beam resist structures A typical problem arising from an extre… read 閱讀全文

High-resolution PMMA one layer resist Utilizing SX AR-P 640/2 (PMMA 90K) as one layer system, an eve… read 閱讀全文

Positive polyimide resist for e-beam-lithography First experiments with our SX AR-P 5000/82.7 using … read 閱讀全文