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標籤: other-photoresist
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Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10 are high-thickness, stable photoresists with… read 閱讀全文
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The new Atlas 46 development is suitable for nanoimprinting, creating defined nanostructures with ne… read 閱讀全文
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Aqueous negative resist based on gelatine allows for photochemical crosslinking with catalytic iron … read 閱讀全文
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The post discusses the process of obtaining alkali-stable positive resist through treatment with HMD… read 閱讀全文
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