標籤: other-EBL resist

Fluorescent e-beam resists, created using PMMA and CSAR 62 polymers with fluorescence dyes, exhibit … read 閱讀全文

A variant of Electra 92 is optimized for novolac-based e-beam resists such as AR-N 7520, AR-N 7700, … read 閱讀全文

The conductivity of resist layers in e-beam lithography is affected by temperature and air humidity.… read 閱讀全文

This content discusses the use of the CAR 44 negative resist for e-beam lithography, allowing for th… read 閱讀全文

Atlas 46 has found a new application in electron beam lithography, demonstrating the ability to writ… read 閱讀全文