標籤: negative-photoresist

Summary: Allresist offers spray resists suitable for extreme topologies, with improved surfaces and … read 閱讀全文

New aqueous-alkali soluble polymers offer high thermal stability for negative resists, preventing me… read 閱讀全文

The negative resist AR-N 4400-10 can be structured with laser exposure at 405 nm, showing arrays wit… read 閱讀全文

Summary: PMMA resist is commonly used for electron beam applications and protective coatings in wet … read 閱讀全文

This content discusses the use of NIR-laser structurable photoresists, highlighting the addition of … read 閱讀全文

The negative two-layer lift-off system offers enhanced thermal stability and distinct undercut gener… read 閱讀全文

A negative polyimide photoresist has been developed as an alternative to positive polyimide resist, … read 閱讀全文

A new high-temperature resistant negative resist, SX AR-N 4340/6, based on polyhydroxystyrene, is de… read 閱讀全文

The content describes the generation of undercut structures with negative resists using laser direct… read 閱讀全文

The study at TU Braunschweig focused on the fabrication of well-defined resist architectures with ve… read 閱讀全文