標籤: FAQs-photoresist

Photoresist films’ solvent resistance varies based on the type used. PMMA resists dissolve easily in… read 閱讀全文

The positive tone photoresist AR-P 5910 is suitable for HF etching of up to 5% HF on glass or silico… read 閱讀全文

Photoresists show different resistance to acids. Concentrated oxidizing acids like sulphuric and nit… read 閱讀全文

Photoresists in the AR-series 3000 to 4000 have high plasma etch resistance due to the polymers used… read 閱讀全文

Photoresists’ resolution and contrast depend on factors like mask liner type, numerical aperture, fi… read 閱讀全文

The optimal processing of thick films (>10 µm) involves careful coating, with specific recommenda… read 閱讀全文

A variety of one- or two-layer systems, such as AR-P 5350 and AR-P 5400 – 3510, can be used to gener… read 閱讀全文

Image-reversal resists like AR-U 4000 can produce positive or negative tone images based on the manu… read 閱讀全文

Protective coatings have diverse applications, including mechanical protection during transport, ins… read 閱讀全文

To remove resist coatings, polar solvents like AR 300-12 and AR 600-70 can be used. For higher-baked… read 閱讀全文