標籤: basic chemistry

The addition of photoactive compounds (PACs, naphthoquinone diazide (NQD)) to alkali-soluble novolac… read 閱讀全文

Polymers such as PMMAs, PMMA co MA, and PMS co Cl-MMA are extensively used in electron beam lithogra… read 閱讀全文

The photoresist’s photosensitive components are naphthoquinone diazides (NQD), which react to form e… read 閱讀全文

The main components of resists are solvents, with contents ranging from 50% to 99%. Early resists co… read 閱讀全文

Photoresists used in microelectronics and microsystems technology create µm- and sub-µm structures. … read 閱讀全文

The patterning of negative resists is achieved through cross-linking agents, such as radical starter… read 閱讀全文

Photoresists used in microelectronics and microsystems technology create µm- and sub-µm structures. … read 閱讀全文