Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The post discusses the use of experimental special deve…
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Adhesion promoters like HMDS and diphenylsilanediol (AR…
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The adhesive strength of AR 300-80 is crucial for preve…
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The use of alkaline developers for aluminium substrates…
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The classification of N-methyl-2-pyrrolidone (NMP) as a…
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Aqueous-alkaline removers, such as sodium hydroxide (Na…
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Developer AR 300-35 is recommended for structuring phot…
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The development of exposed CSAR 62 resist films is typi…
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Dr. Lothar Hahn from the Karlsruhe Institute of Technol…
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The article discusses the use of adhesion promoter AR 3…
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Summary: For the development of AR-P 5320 positive phot…
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The article discusses the evaluation of new developer s…
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The new developer X AR 600-50/2 is highly sensitive and…
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The new remover AR 300-76 offers a safer alternative to…
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