Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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Photoresists, used in microelectronics and microsystems…
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Photoresists are light-sensitive and their stability de…
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Age-related changes can significantly impact the qualit…
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The optimal pre-treatment of substrates for photoresist…
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Photoresist adhesion varies on different wafers. Substr…
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The optimum coating parameters for photoresists to achi…
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Air bubbles can form in photoresist films due to agitat…
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The softbake of photoresist films, performed at 90 – 10…
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Photoresists are exposed using masks in suitable exposu…
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Photoresist developers are key to achieving reproducibl…
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To remove resist coatings, polar solvents like AR 300-1…
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Protective coatings have diverse applications, includin…
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Image-reversal resists like AR-U 4000 can produce posit…
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A variety of one- or two-layer systems, such as AR-P 53…
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The optimal processing of thick films (>10 µm) invol…
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Photoresists’ resolution and contrast depend on factors…
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Photoresists in the AR-series 3000 to 4000 have high pl…
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Photoresists show different resistance to acids. Concen…
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The positive tone photoresist AR-P 5910 is suitable for…
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Photoresist films’ solvent resistance varies based on t…
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