Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
閱讀愉快
The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
Articles
Content Preview
Categories & Tags
-
E-beam resists are used for fabricating highly integrat…
-
E-beam resists such as PMMA, copolymer, and styrene acr…
-
The optimal pre-treatment of substrates for e-beam resi…
-
E-beam resists exhibit varying adhesion strengths to di…
-
E-beam resists are exposed using short-wavelength elect…
-
E-beam resists require optimal developers for effective…
-
E-beam resist films can be removed using polar solvents…
-
E-beam resists can achieve resolutions of 2 nm theoreti…
-
E-beam resists like AR 6000 and AR 7000 series show var…
-
E-beam resists show varying resistance to strong acids.…
-
E-beam resist films exhibit varying solvent resistance …
-
2-layer PMMA e-beam resist system for high-resolution l…
-
Photoresist films’ solvent resistance varies based on t…
-
The AR-P 617 two layer lift-off system involves using a…
-
Atlas 46 has found a new application in electron beam l…
-
This content provides a comprehensive overview of elect…
-
BOE etching of SiO2 with CSAR 62 mask Many applications…
-
This content discusses the use of the CAR 44 negative r…
-
The SX AR-N 7730/37 is a chemically amplified, highly s…
-
Collapse of extreme high-resolution e-beam resist struc…
Techpoint 久理企業 