Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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A spray coating known as SX AR-PC 5000/22 can be used to create an extremely smooth surface on glass… read 閱讀全文
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The protective coatings AR-PC 503 and 504 are resistant to 40% warm KOH and can protect wafers durin… read 閱讀全文
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A novolac-based resist, resist SX AR-PC 5000/3.1, offers protective coating to prevent mechanical da… read 閱讀全文
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The proximity effect in electron beam lithography occurs when high-energy electrons are stopped or m… read 閱讀全文
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The content discusses the raster and vector scan principles in electron beam lithography. Raster sca… read 閱讀全文
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The post discusses the importance of high-resolution negative e-beam resists, particularly focusing … read 閱讀全文
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Removers are crucial for dissolving resist structures or residues after technological processes like… read 閱讀全文
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The most widely used resists in composition are positive and negative photoresists. There are also s… read 閱讀全文
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The content discusses resist for 488 nm exposure wavelength and its implications in the context of U… read 閱讀全文
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A new resist series sensitive to laser exposure in the 500-1100 nm range has been developed, enablin… read 閱讀全文
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Allresist, in collaboration with Aglycon, Joanneum Research, and SwissLitho AG, is developing high-q… read 閱讀全文
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Summary: The PMMA protective coatings AR-PC 503 and AR-PC 504, traditionally made with chlorobenzene… read 閱讀全文
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SCALPEL, or Scattering with Angular Limitation Projection Electron-beam Lithography, is a mask-based… read 閱讀全文
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When a high-energy electron beam is directed onto a resist layer, it causes both forward and backwar… read 閱讀全文
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Summary: PMMA resist is commonly used for electron beam applications and protective coatings in wet … read 閱讀全文
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The negative resist AR-N 4400-10 can be structured with laser exposure at 405 nm, showing arrays wit… read 閱讀全文
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The success of electron beam lithography started with the development of PMMA resists in the 1980s. … read 閱讀全文
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Electron-beam lithography (EBL) offers unlimited resolution due to the small wavelength of 25keV ele… read 閱讀全文
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Solvent removers play a crucial role in lab cleaning. Acetone and isopropanol are widely used, but p… read 閱讀全文
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The content discusses the importance of workplace safety when handling chemicals containing organic … read 閱讀全文
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