Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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To remove resist coatings, polar solvents like AR 300-12 and AR 600-70 can be used. For higher-baked… read 閱讀全文
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E-beam resist films exhibit varying solvent resistance based on the raw materials used. The four cat… read 閱讀全文
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Protective coatings have diverse applications, including mechanical protection during transport, ins… read 閱讀全文
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Image-reversal resists like AR-U 4000 can produce positive or negative tone images based on the manu… read 閱讀全文
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A variety of one- or two-layer systems, such as AR-P 5350 and AR-P 5400 – 3510, can be used to gener… read 閱讀全文
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The optimal processing of thick films (>10 µm) involves careful coating, with specific recommenda… read 閱讀全文
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Photoresists’ resolution and contrast depend on factors like mask liner type, numerical aperture, fi… read 閱讀全文
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Photoresists in the AR-series 3000 to 4000 have high plasma etch resistance due to the polymers used… read 閱讀全文
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Photoresists show different resistance to acids. Concentrated oxidizing acids like sulphuric and nit… read 閱讀全文
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The positive tone photoresist AR-P 5910 is suitable for HF etching of up to 5% HF on glass or silico… read 閱讀全文
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2-layer PMMA e-beam resist system for high-resolution l read 閱讀全文
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Photoresist films’ solvent resistance varies based on the type used. PMMA resists dissolve easily in… read 閱讀全文
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The article discusses the use of Anisole PPA solutions to coat PMMAcoMA 33 (AR-P 617) for creating d… read 閱讀全文
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The two-layer resist AR-BR 5460, with its non-light-sensitive bottom resist, has been effectively ut… read 閱讀全文
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The post discusses the use of experimental special developers for various applications, particularly… read 閱讀全文
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Adhesion promoters like HMDS and diphenylsilanediol (AR 300-80) are crucial for improving resist adh… read 閱讀全文
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The post discusses adhesive agents like AR 300-80 and HMDS to improve adhesion in e-beam lithography… read 閱讀全文
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The adhesive strength of AR 300-80 is crucial for preventing PMMA layer stripping from a wafer. Usin… read 閱讀全文
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Aqueous-alkaline developers can age due to CO2 absorption, with buffered types being more stable tha… read 閱讀全文
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The novolac-based negative-tone resist offers superior stability in strongly alkaline solutions and … read 閱讀全文
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