Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The DESIRE process enables electron beam lithography, where structures are written into a resist lay… read 閱讀全文
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The two-layer e-beam resist system with novolacs as the bottom resist allows for adjustable removal … read 閱讀全文
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The two-layer photoresist system, consisting of PMMA resist and photoresist, provides protection aga… read 閱讀全文
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A new two-layer resist system has been developed to address the challenges of hydrofluoric acid (HF)… read 閱讀全文
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This content discusses two main groups of developers used in semiconductor manufacturing: solvent-ba… read 閱讀全文
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The use of anisolic PPA solutions allows for the creation of well-defined two- and three-layer syste… read 閱讀全文
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The use of Electra 92 as a conductive coating in scanning electron microscopy (SEM) applications has… read 閱讀全文
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The UV-structuring of PMMA resists can be achieved using deep UV light with exposure wavelengths of … read 閱讀全文
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UV curing Photoresist structures of standard resists po read 閱讀全文
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Water-based photoresists offer an alternative to traditional organic solvent-soluble photoresists. T… read 閱讀全文
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Water-based photoresists offer an alternative to traditional organic solvent-soluble photoresists. T… read 閱讀全文
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Wet chemical etching In wet-chemical etchings, the chem read 閱讀全文
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The content discusses the calculation of minimum exposure time for a specific area at a given dose. … read 閱讀全文