Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The Eurostar PPA-Litho project successfully developed the resist Phoenix 81 with improved stability,… read 閱讀全文
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The content discusses the challenges of coating Teflon substrates with photoresist due to their hydr… read 閱讀全文
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The photoresist’s photosensitive components are naphthoquinone diazides (NQD), which react to form e… read 閱讀全文
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Mr. Chi Tang has been working since 2015 at the University of California using Electra 92 for PMMA l… read 閱讀全文
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A new PMMA test sample with lower molecular weight has been developed to reduce the “cotton candy ef… read 閱讀全文
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PMMA e-beam resist with flat gradation for three-dimens read 閱讀全文
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PMMA e-beam resist, positive and negative in the case o read 閱讀全文
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The content discusses the use of poly(phthalaldehyde) (PPA) as an electron beam resist for direct po… read 閱讀全文
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The University of Tübingen has conducted experiments on poly(phthalaldehyde) (PPA)-based electron be… read 閱讀全文
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This content discusses the use of two-layer polyimide systems for specific applications where the or… read 閱讀全文
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Polymers such as PMMAs, PMMA co MA, and PMS co Cl-MMA are extensively used in electron beam lithogra… read 閱讀全文
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Polyimides, produced through a 2-step procedure, are suitable for high thermal strain due to their a… read 閱讀全文
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Positive polyimide resist for e-beam-lithography First read 閱讀全文
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This content discusses the use of positive resist for temperature-sensitive substrates, especially f… read 閱讀全文
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Two positive-tone two-layer lift-off systems, the AR-P 5400-3510 series and PMGI variant, have been … read 閱讀全文
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The report discusses the use of PPA for two-layer systems. It covers the development rates of AR P-6… read 閱讀全文
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The addition of photoactive compounds (PACs, naphthoquinone diazide (NQD)) to alkali-soluble novolac… read 閱讀全文
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The process conditions for coating with resist involve several considerations to avoid the formation… read 閱讀全文
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The development of PMMA films for e-beam lithography involves using solvent-based developers like MI… read 閱讀全文
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This content provides detailed information on the process step of photoresist, including cleaning of… read 閱讀全文
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