Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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The post discusses the process of obtaining alkali-stable positive resist through treatment with HMD… read 閱讀全文
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The post discusses the positive resist SX AR-P 5900/8, known for its alkaline stability and ease of … read 閱讀全文
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The use of alkaline developers for aluminium substrates presents challenges, as some developers can … read 閱讀全文
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The classification of N-methyl-2-pyrrolidone (NMP) as a reproductive toxicant has led to the removal… read 閱讀全文
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Aluminium structures developed directly The fabrication read 閱讀全文
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Aqueous negative resist based on gelatine allows for photochemical crosslinking with catalytic iron … read 閱讀全文
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Aqueous-alkaline removers, such as sodium hydroxide (NaOH) and potassium hydroxide (KOH) solutions, … read 閱讀全文
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Photoresist films’ solvent resistance varies based on the type used. PMMA resists dissolve easily in… read 閱讀全文
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The AR-P 617 two layer lift-off system involves using a resist called AR-P 617 to create a well-defi… read 閱讀全文
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Atlas 46 has found a new application in electron beam lithography, demonstrating the ability to writ… read 閱讀全文
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The new Atlas 46 development is suitable for nanoimprinting, creating defined nanostructures with ne… read 閱讀全文
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Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10 are high-thickness, stable photoresists with… read 閱讀全文
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This content provides a comprehensive overview of electron beam lithography (EBL) resists, including… read 閱讀全文
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The black resist developed can disable substrate transparency while allowing structure generation, c… read 閱讀全文
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Allresist has introduced the Black-Protect coating, SX AR-PC 5000/41, designed to withstand HF and K… read 閱讀全文
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The dyed resists developed in the Photoenco project involved mixing dyes into the polymer matrix of … read 閱讀全文
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BOE etching of SiO2 with CSAR 62 mask Many applications read 閱讀全文
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This content discusses the use of the CAR 44 negative resist for e-beam lithography, allowing for th… read 閱讀全文
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CAR 44 on copper is a negative photoresist that requires special attention when used on copper subst… read 閱讀全文
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Chemical dry etching Chemical dry etchings fall into tw read 閱讀全文
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