Resist Wiki 微影阻劑百科
The Resist Wiki is a knowledge platform covering current technologies of micro electronics which is permanently updated to add further information from our research and development activities.
We have broken it down into the six topics “basics, e-beam resist, photoresist, protective resist, bottom resist and process chemicals” so that you can quickly find what you are looking for.
Have fun while reading!
微影阻劑百科為一資訊平台,涵蓋現有技術及持續的研究開發. 內容分為六大主題: 阻劑基礎, 電子束微影, 光阻, 保護塗層,底層阻劑及微影製程化學品.
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The content is from product principals, ALLRESIST and translate into Chinese. You may visit ALLRESIST from link below.
內容取材自原廠並翻譯. 可自下方連結至原廠網站
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Solvents in e-beam resists The beginning of electron be read 閱讀全文
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Summary: Allresist offers spray resists suitable for extreme topologies, with improved surfaces and … read 閱讀全文
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The content discusses the use of spray resists for different topologies and the characteristics of s… read 閱讀全文
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Stabilisation / hardening of resist films A large varie read 閱讀全文
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Stoppers are essential in electron beam lithography with PMMA resists. They halt the development pro… read 閱讀全文
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Photoresists are light-sensitive and age during storage, so they are supplied in light-protected bot… read 閱讀全文
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Laser ablation involves using laser irradiation to destroy and vaporize resist materials, creating t… read 閱讀全文
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The content discusses the structuring of polyphthalaldehydes using photolithography. It explains the… read 閱讀全文
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The SX AR-N 7100 is a negative photoresist system that utilizes surface imaging and dry development … read 閱讀全文
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The SX AR-PC 5060 F-Protect is a new and highly insulating protective coating that serves as an alte… read 閱讀全文
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T-gates with three-layer system Publication MNE 2017 T- read 閱讀全文
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Temperature resistance of e-beam polymers Layers and st read 閱讀全文
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New aqueous-alkali soluble polymers offer high thermal stability for negative resists, preventing me… read 閱讀全文
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The Resist Wiki article discusses thermally stable two-layer lift-off systems, highlighting the use … read 閱讀全文
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The thermostable photoresists, SX AR-N 4340/6 and SX AR-P 3500/8, can withstand high temperatures up… read 閱讀全文
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The content discusses thermostable photoresists, including negative resist SX AR-N 4340/6 and positi… read 閱讀全文
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This article discusses the correct dilution of resists and the use of specific solvents as thinners … read 閱讀全文
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3-layer system CSAR/PMMA-co-MA/PMMA A further variant f read 閱讀全文
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The top surface imaging (TSI) photoresist utilizes selective resist silylation to create high-resolu… read 閱讀全文
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The top surface imaging (TSI) photoresist technology, based on a selective resist silylation process… read 閱讀全文
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