AR-PC 504 protective coating
adhesion-enhanced KOH-resistant resists
Wafer backside protection coating for the application of deep trench
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AR-PC 504 product brief 產品簡介
AR-PC 500 series 系列產品為保護型塗佈,耐氫氧化鉀,適合濕蝕刻製程晶背保護. 系列產品目前有:
AR-PC 503 :PMMA高分子,溶劑為氯苯(chlorobenzene)。成份中參雜深色染料以保護敏感元件。
AR-PC 504 :PMMA高分子,溶劑為氯苯(chlorobenzene)。
AR-PC 5040:PMMA高分子,溶劑採用較安全的甲氧苯(anisole)。
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AR-PC 504 properties and features 產品物性與特性
Properties
| Film thickness | 2.2 um@4000rpm |
| Flash point | 28 ℃ |
| Storage 6 months | 18 – 25 ℃ |
* Product is guaranteed 6 months shelf life
from the data of sale if stored correctly.
在正確的儲存條件下,產品保證的有效期為銷售日起6個月
* Product can also be used without
guarantee until the date indicated on the label.
在無提供保證的情況下,產品可使用至標籤上所示的有效期.
Features
- not light-sensitive > 300 nm, no yellow light required
對波長> 300nm無反應,無需於黃光區作業 - protection of wafer backside when etching the front side
晶圓蝕刻時做為晶背保護塗佈 - offer reliable protection against mechanical damage during handling and transport
也可在作業或運輸時提供晶圓保護以避免破壞 - temperature-stable up to 250°C
高溫達250℃仍可保持穩定 - PMMA with different molecular weights, AR-PC 503 in addition dyed dark
成份含不同分子量的聚甲基丙烯酸甲酯(PMMA),AR-PC 503另添加黑色染料 - solvent chlorobenzene
使用氯苯為溶劑
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AR-PC 504 packing and shipping 產品包裝與出貨
Packing 產品包裝:
✅ 250 ml/瓶
✅ 1 L/瓶
其它包裝可依客戶需求增加.
Shipping 出貨:
✅ 2 – 4 週: 徳國運出
❎ 1 週: 國內庫存
(目前暫無國內庫存)
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AR-PC 500 series product comparison 系列產品物性比較


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AR-PC 500 series Spin curve 塗佈曲線

● AR-PC 5040
● AR-PC 504
● AR-PC 503
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Application example
Photo of coated wafer

Protective coating AR-P 503 covering sensitive structures
Topology of the backside

Protective coating AR-PC 504 covering sensitive structures
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Process baseline 製程參數
This diagram shows exemplary process steps for AR-PC 500 series resists. All specifications are guideline values which must be adapted to own specific conditions. For further information on processing, 👉 “ Detailed instructions for optimum processing of photoresists”. For recommendations on wastewater treatment and general safety instructions, 👉 ”General product information on Allresist photoresists”.
圖示AR-PC 500系列產品製程參數的範例. 所有參數為參考值,使用者應依設備環境實際狀況加以調整

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Process instruction 製程參數說明
Pre-treatment prior to coating:
The protective effect during etching can be extended to up to 8 hours if the surface is pretreated with adhesion promoter AR 300-80. The coating is preferably performed at 4000 rpm. After tempering at 180 °C for 2 min (hot plate), a uniform, 15 nm thin layer of adhesion promoter is formed (-> Product information AR 300-80)
塗佈前處理(增黏處理):
以AR 300-80增黏處理可使保護塗層於蝕刻時保護性增至8小時. 增黏塗層建議以4000轉塗佈再以180℃在熱盤軟烤2分鐘,可獲得15nm均勻的增黏塗層。 (細節請參考AR 300-80產品資訊)
Coating:
A rotational speed of 1000 rpm is recommended for protective coatings, since at a film thickness of 2 – 5 μm wafer edges are best protected due to a certain “edge wrapping” of the resist. At higher spin speeds or if 6-inch wafers and above are used, the relatively high amount of resist which is deposited on the wafer may cause the so-called candy-floss effect. Low spin speeds, local exhaustion or removal of the “candy floss” with a glass rod during coating reduces these highly disturbing effects
保護塗層塗佈:
建議的轉速為1000轉.此轉數下,膜厚約2 – 5um,晶元邊緣亦可形成包覆。
在較高轉速的塗佈,或晶元大於6寸時,保護膠需滴定較大數量,此時容易形成”糖絲效應”。
降低轉速,排氣,或以玻璃棒移除絲狀物以減少其影響。
Tempering:
To obtain a particularly high protective effect for the fabrication of hard-baked films, tempering temperatures of 190 °C are recommended.
軟烤: 建議以 190℃ 高溫軟烤以獲得有效的保護塗層。
Etch process:
The protective coating is even after hours not attacked by 40 % KOH. Possibly occurring problems only derive from insufficient adhesive strength and can be significantly reduced with a pre-treatment with AR 300-80.
蝕刻製程:
保護塗層可耐40%氫氧化鉀幾小時的攻擊. 通常是由介面黏著度不夠而導致問題. 使用AR 300-80增黏劑可有效解決此問題.
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