Lithorgraphy Materials & ancillaries
微奈米微影製程材料
Photoresist 光阻劑
AR-P 1200 series (positive spray PR)
AR-P 3100 series (adhesion enhenced)
AR-P 3200 series (PR for Electro-plating)
AR-P 3500 (T) series (std positive PR)
AR-P 5300 series (positive PR for lift-off)
SX AR-P 3500/8 (high temperature stable)
AR-N 2200 series (negative spray PR)
AR-N 4340 (std nega CAR PR for IC)
SX AR-N 4340/7 (thermal stable PR)
AR-N 4400 series (thick nega PR)
EBL Resist 電子束微影阻劑
tSPL Resist 熱掃描微影阻劑
Conductive Coating 導電塗佈
Protective Resist 蝕刻保護塗層
Bottom Resist for 2L lift-off 底層阻劑
Lithography Process Chemicals 微影製程化學品
Adhesion Promoter 增黏劑
Developer 顯影劑
AR 300-44 metal ion-free developer
AR 300-46 metal ion-free developer
AR 300-47 metal ion-free developer
AR 300-475 metal ion-free developer
AR 600-50 ultra pure e-beam developer
AR 600-55 ultra pure e-beam developer
AR 600-56 ultra pure e-beam developer
AR 600-57 MIBK-free PMMA developer
AR 600-546 weaker developer for CSAR 62
AR 600-548 strong developer for CSAR 62
































