AR 600-60 stopper
For the stopping resist and protection film development process
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AR 600-60 Product brief 產品簡介
顯影抑制劑主要用於電子束微影或保護塗佈的顯影製程，可使顯影製程中斷，避免過度顯影或殘留顯影劑造成製程瑕疵。亦可於顯影劑中加入10-20%以降低顯影速率。
系列產品中AR 600-60主要用於下列電子束微影阻劑顯影中止製程:
AR-P 630 – 670 PMMA EBL resist
AR-P 617 series copolymer EBL resist
AR-P 6200 series copolymer EBL resist
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Packing 產品包裝:
✅ 1 L/瓶
其它包裝可依客戶需求增加.
Shipping 出貨:
✅ 2 – 4 週： 徳國運出
❎ 1 週： 國內庫存
(目前暫無國內庫存)
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Product Features 產品特性
- immediate interruption of the development process
可立即中斷顯影製程 - ultrapure solvent mixtures for residue-free removal of remaining developer
高純度混合溶劑,可有效的去除殘留的顯影液 - If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.
於顯影液AR 600-50 / AR 600-55 / AR 600-56中加入20%的AR 600-60抑制劑，可降低顯影速率。
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Product properties 產品物性
| AR 600-60 | |
| Main components 主要成分 | propan-2-ol 異丙醇 |
| Density at 20℃ (g/cm3) 密度 | 0.785 |
| Refractive index at 20℃ 折射率 | 1.402 |
| Water content max. 最大含水量（％) | 0.1 |
| Non-volatiles max. 非揮發成份(%) | 0.002 |
| Flash point (℃) 閃火點 | 12 |
| Filtration 過濾規格(um) | 0.2 |
| Storage 6 months 儲存溫度( ℃) | 10 – 22 |
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Dedicated stopper for resist 適用阻劑
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AR-P 630 – 670 PMMA resist
The AR-P 630 – 670 series is a range of PMMA positive resist with di… read
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AR Stopper family introduction 系列顯影抑制劑說明
| Properties |
| AR 600-60 | AR 600-61 | X AR 600-60/1 |
| Main components 主要成分 |
| 異丙醇 | 二乙二醇丁醚 | 正辛烷 |
| Density at 20℃ (g/cm3) 密度 |
| 0.785x | 0.964 | 0.703 |
| Refractive index at 20℃折射率 |
| 1.402 | 1.517 | — |
| Water content max. 最大含水量％ |
| 0.1 | 20 | — |
| Non-volatiles max. 非揮發成份(%) |
| 0.002 | 0.002 | — |
| Flash point (℃) 閃火點 |
| 12 | 105 | 13 |
| Filtration 過濾規格(um) |
| 0.2 |
| Production status 生產排程1 |
| routine1 | on-demand | routine |
| Lead time 交期 |
| 2 – 4 週 |
| Product packing 產品包裝 |
| 1 L/瓶 |
| Storage 6 months 儲存溫度( ℃) |
| 10 – 22 | 10 -2 2 | 10 – 22 |
| Stopper for PMMA EBL resist |
| ✅ |
| Stopper for AR-P 617 EBL resist |
| ✅ |
| Stopper for AR-P 6200 EBL resist |
| ✅ |
| Stopper for AR-P 6510 EBL resist |
| ✅ |
| Stopper for AR-P 4600 photoresist |
| ✅ |
| Stopper for AR-PC 5000/41 |
| ✅ |
| Remark： ： |
| 1. routine: 固定排程生產，交期約2-4週。 on-demand: 無固定排程生產,價格需先詢問。可能有最低採購量要求。 |
Information on stopper process 顯影抑製劑相關資訊:
The addition of stopper for approximately 30 s after development interrupts the development process and leads to a rapid rinsing of residual developer.
Due the processing regime however, constantly developer is transferred into the stopper bath. Already small amounts of the developer will affect the efficiency of the stopping process. It is thus highly recommended to constantly exchange the stopper or to use two stopper baths which are arranged consecutively.
If 10-20 % of stopper AR 600-60 is added to developers AR 600-50, 600-55 and 600-56, the development process is slowed down.
If the stopper AR 600-60 is used for developers AR-P 630-670, higher contrast values up to 10 are possible, while the sensitivity of the PMMA resists is at the same time decreased. Higher exposure doses and prolonged development times are thus required in this case.
加入抑制劑約30秒後， 會中斷顯影且導致快速增加的顯影液殘留。
規律的製程會使顯影液不斷的被帶入抑制槽,，少量的顯影液就會降低抑制效果。 建議經常性的更換槽液,，或者使用雙抑制槽的設計。
在AR 600-50，AR 600-55及AR 600-56等顯影液加入20%的AR 600-60 stopper可降低顯影速率。
AR 600-60 stopper用於AR-P 630-670 PMMA EBL resist，可使對比提高到10；但同時也會降低敏感度。 這種情況下，建議提高曝光劑量及延長顯影時間。
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