AR-PC 5094.02

Electra 92 Product Brief 產品說明

Electra 92 應用於電子束微影或顯微鏡分析,於絕緣基板上塗佈導電層,使電子束曝光時電荷得以逸散.由於產品持續不斷優化，從溶劑改良到產品穩定性，塗佈品質等不斷改善，目前最新通用型版本的產品編號為：AR-PC 5094.02
產品適用於各類型阻劑，例如CSAR 62 （複合高分子copolymer）；Medusa 84 SiH (HSQ)，酚醛樹酯（novolac)，PMMA等，涵蓋大部份阻劑類型，但不適用CAR阻劑（化學放大型）^註1 。
與舊版本產品比較，及其生產狀況，請參考與舊版產品比較。
註1：適用於CAR type的版本目前開發中，待完成後發表。

AR-PC 5092.02 packing & shipping

Packing 產品包裝:

✅ 100 ml/瓶
✅ 250 ml/瓶
✅ 1 L/瓶
其它包裝可依客戶需求增加.

✏️ 價格詢問

✏️ 其它諮詢

Shipping 出貨:

✅ 2 – 4 週：徳國運出
❎ 1 週：國內庫存
(目前暫無國內庫存)

📤 產品GHS標識

AR-PC 5094.02 Features 產品特性

as a protective coating, this resist is not sensitive to light / radiation
此導電保護塗佈材料對光/輻射不感應
thin, conductive layers for the dissipation of charges during electron exposure
塗佈形成導電薄膜使電子束曝光時,電荷得以逸散
for coating on all AR e-beam resists, e.g. CSAR 62, Medusa 84 SiH, except CAR resists
適用於各類型阻劑,例如: CSAR 62, HSQ等。但不適用於化學放大型阻劑

Improved properties compared to AR-PC 5092.02
由前版本持續優化改良
easy removal with water after exposure
曝光後可輕易以水去除
polyaniline-derivative dissolved in water
主要成分為溶於水的聚苯胺衍生物

Product properties 產品物性

AR-PC 5094.02 Property I
Parameter		AR-PC 5094.02
Solid content 固型份	%	2
Viscosity@25℃ 黏度	mPas	1
Film thickness@4000 rpm 膜厚	nm	42
Film thickness@1000 rpm膜厚	nm	100
Resolution / Contrast	nm/–	– –
Storage temperature* 儲存溫度	℃	8 – 12
* Product is guaranteed 6 months shelf life from the data of sale if stored correctly. 在正確的儲存條件下,產品保證的有效期為銷售日起6個月. * Product can also be used without guarantee until the date indicated on the label. 在無提供保證的情況下,產品可使用至標籤上所示的有效期.
AR-PC 5092.02 Property II
Conductivity (@ 60nm FT)	S/m	1.2

Conductivity 導電度

Conductivity measurements of AR-PC 5094.02 layers obtained after spin
deposition. For thinner films, the resistance increases and the conductivity decreases.

AR-PC 5094.02的導電度於塗佈後測得. 膜厚越低,其導電阻抗增加而導電度下降. 如圖.

Process baseline 製程參數

Medusa 84 SiH (HSQ) on quartz with AR-PC 5094.02 導電塗層與HSQ搭配範例

Siemens star written on quartz with the new conductive coating Electra 92 (AR-PC 5094.02) spun on to prevent charge build-up. This variant of Electra 92, specially developed for HSQ, has excellent coating and adhesion properties. © B. Drent, AMOLF NanoLab Amsterdam

Electra 92 (AR-PC 5094.02)為新版導電塗層，對HSQ有良好塗佈特性及黏著度。
下圖為Medusa 84 SiH搭配新版Electra 92於石英基板寫出西門子星標的範例。

Electra 92 product comparison 產品比較

Properties		AR-PC 5090.02	AR-PC 5091.02	AR-PC 5092.02	AR-PC 5094.02
Solid content (固型份)	%	2	2	2	2
Viscosity (黏度)	mPas	1	1	1	1
Thickness (厚度) vs Spin speed (轉速)	nm rpm	42 – 100 @ 4000 – 1000	31 – 80 @ 4000 – 1000	42 – 100 @ 4000 – 1000	42 – 100 @ 4000 – 1000
Specific conductivity (@60nm FT)導電度	S/m	～10⁰	～10⁰	～10⁰	1.2
Conductive polymer (高分子類型)		polyaniline-derivative	polyaniline-derivative	polyaniline-derivative	polyaniline-derivative
Solvent (使用溶劑)		Water & IPA	Water & IPA	Water	Water
Resist compatibilities (適用阻劑類型)		non-novolac PMMA co-polymer (CSAR 62) HSQ (Medusa 82)	novolac base resist	(universal type) novolac base resist PMMA co-polymer (CSAR 62) HSQ (Medusa 82) and others	universal except CAR^*
Production status (供應情況)		discontinue	discontinue	phase out (on-demand)^*	routine
Remark 說明		1 適用於化學放大型(CAR resist)的版本開發中，將於近日發表。 2 on-demand為無固定排程，需預定生產。可能會有最小數量，或等待生產批次。

Conductive coating of PMMA resist Thsi diagram shows exemplary process steps Electra92 (AR-PC 5094.02) and PMMA resist AR-P 664.04. All specifications are guideline values which have to be adapted to own specific conditions. 本製程參數是以 AR-PC 5094.02 (Electra 92) 與AR-P 664.04 (PMMA resist)為範例. 建議使用者依實際材料組合調整參數.
1^st Coating		AR-P 662.04 on insulating substrate (quartz, glass, GaAs) 140nm@4000rpm x 60sec
1^st soft bake (±1℃)		150 ℃ x 2 min hot plate, or 150 ℃ x 30 min convection oven
2^nd Coating conductive layer		AR-PC 5094.02 60nm@2000rpm x 60sec
2nd soft bake (±1℃)		90°C x 2min hot plate or 85°C x 25min convection oven
e-Beam exposure		ZBA 21, 20 kV Exposure dose (E₀): 110 uC/cm² (AR-P 662.04, 140nm)
Removal Conductive layer		AR-PC 5094.02 DI water, 60sec
Development puddle (21-23 ± 0.5℃)		Resist: AR-P 662.04 Developer: AR 600-56 x 2min Stopper: AR 600-60 x 30sec
Post-bake (optional)		130°C x 1min hot plate or 130°C x 25min convection oven for slightly enhanced plasma etching stability
User specific process		Generation of e.g. semiconductor properties, etching, sputtering….
Removal		AR 600-71 or O2 plasma ashing
Process hints The conductivity may be varied by adjusting the thickness with different rotational speeds. Thicker layers of 90 nm thus have a 2.5 times higher conductivity as compared to 60 nm thick layers. For the build-up of an even conductive layer, the substrate should be wetted with the resist solution before the spin process is started. 導電度可依導電層厚度加以調節. 90nm厚的導電層比60nm厚其導電度高約2.5倍. 導電層塗佈前先以阻劑的溶劑濕潤基板可獲得較均勻的厚度.