AR-BR 5400 series (bottom resist)

AR-P 630-670 series PMMA resist

AR-P 617 series copolymer resist

AR-P 6200 series copolymer resist

AR-P 6510 series thick EBL resist

AR-N 7500 series (non-CAR tyoe)

AR-N 7520_new series (non-CAR type)

AR-N 7520 series (non-CAR type)

AR-N 7700 series (CAR type)

AR-N 7720 series (CAR type)

SX AR-N 8400 series (HSQ)

PPA polymer, preparation kit and AR-P 8100

AR-PC 5094.02 (Electra 92)

AR-PC 5092.02 (Electra 92)

AR-P 1200 series (positive spray PR)

AR-P 3100 series (adhesion enhenced)

AR-P 3200 series (PR for Electro-plating)

AR-P 3500 (T) series (std positive PR)

AR-P 3740 (std positive PR)

AR-P 5300 series (positive PR for lift-off)

SX AR-P 3500/8 (high temperature stable)

AR-N 2200 series (negative spray PR)

AR-N 4340 (std nega CAR PR for IC)

SX AR-N 4340/7 (thermal stable PR)

AR-N 4400 series (thick nega PR)

AR-N 4650-10 (thick PR for plating)

AR-N 4600-10 (thick permanent film)

AR-PC 504 (Resist for KOH etching)

AR-PC 5040 (Resist for KOH etching)

SX AR-PC 5000/41 (Resist for KOH & HF)

Adhesion Promoter 增黏劑

AR 300-80 new

Developer 顯影劑

AR 300-26 buffered developer

AR 300-35 buffered developer

AR 300-44 metal ion-free developer

AR 300-46 metal ion-free developer

AR 300-47 metal ion-free developer

AR 300-475 metal ion-free developer

AR 600-50 ultra pure e-beam developer

AR 600-55 ultra pure e-beam developer

AR 600-56 ultra pure e-beam developer

AR 600-57 MIBK-free PMMA developer

AR 600-546 weaker developer for CSAR 62

AR 600-548 strong developer for CSAR 62

AR 600-549 moderate developer for CSAR 62

X AR 600-50/2 developer for multi-layer application

Remover 去除劑

AR 300-70 organic solvent

AR 300-72 organic solvent

AR 300-73 aqueous-alkaline solution

AR 300-76 organic solvent

AR 600-71 organic solvent

Stopper 顯影抑制劑

AR 600-60

AR 600-61

X AR 600-60/1

Thinner 稀釋劑

AR 300-12

AR 600-02

AR 600-07

AR 600-09

X AR 300-74/1