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EBL resist 電子束微影阻劑
AR-P 630 – 670 PMMA resist
AR-P 617 series copolymer EBL resist
AR-P 6200 series copolymer EBL resist
AR-P 6510 series thick resist exposure by ebeam, synchrotron or x-ray附註
AR-N 7520 series EBL resist, non-CAR type
AR-N 7520 new series EBL resist, non-CAR type
AR-N 8400 series (Medusa 84 SiH) HSQ EBL resist
tSPL resist 熱掃描微影阻劑
PPA polymer and preparation kits
Conductive coating 導電塗佈
AR-PC 5094.02 conductive coating
Photoresist 光阻
AR-P 1200 series positive photoresist for spray coating
AR-P 3100 series adhesion enhenced positive photoresist
AR-P 3200 series thick positive photoresist for electro-plating
系列產品中AR-P 3250為固定排程生產
AR-P 3500 series standard positive photoresist
AR-P 3740 series standard positive photoresist
AR-P 5350 positive photoresist for lift off
SX AR-P 3500/8 positive photoresist thermostable up to 300℃
AR-N 2200 series negative photoresist for spray coating
AR-N 4340 negative CAR photoresist for sub-un application
SX AR-N 4340/7 negative photoresist thermostable up to 300℃
AR-N 4400 series thick layer negative photoresist
AR-N 4600-10 thick layer negative photoresist for permanent film
Protective resist 蝕刻保護層
AR-PC 5040 resist for KOH etching
SX AR-PC 5000/41 resist for KOH and HF etching
Bottom resist for 2L lift off 底層阻劑
AR-BR 5400 series bottom resist
Lithography Process Chemicals 微影製程化學品
Adhesion promoter 增黏劑
AR 300-80 new (organic silicon compound)
Developer 顯影劑
buffered developer 含緩衝鹼性水溶液 AR 300系列
(AR 300-26 ; AR 300-35)
metal ion free developer 不含金屬離子TMAH水溶液 AR 300-40系列
(AR 300-44 ; AR 300-46 ; AR 300-47 ; AR 300-475 )
AR 600 family ultra pure developer for ebeam resist
TMAH 2.38% 20L 桶裝
Remover 阻劑去除劑
AR remover family
Photoresist stripper – solvent mixture without NMP, DMSO and TMAH
通用型光阻去除劑 – 不含NMP,DMSO,TMAH成份
Stopper 顯影抑制劑
Stopper family – AR 600-60 ; AR 600-61, X AR 600-60/1
Thinner 稀釋劑
Thinner family – AR 300-12; AR 600-02; AR 600-07; AR 600-09; AR 300-74/1