分類: resist basic

Wet chemical etching In wet-chemical etchings, the chemical bonds of the material to be processed ar… read 閱讀全文

UV curing Photoresist structures of standard resists possess a softening point of 115 – 130 °C. Duri… read 閱讀全文

Stabilisation / hardening of resist films A large variety of applications require structured resist … read 閱讀全文

Interference lithography Interference lithography is a less frequently used method for patterning. T… read 閱讀全文

Exposure Contact exposure Contact exposure refers to a process in which a photo mask and a substrate read 閱讀全文

Determining the conductivity of Electra 92 layers on glass The specific conductivity of thin films c… read 閱讀全文

Chemical dry etching Chemical dry etchings fall into two categories depending on the etching princip… read 閱讀全文

Aluminium structures developed directly The fabrication of aluminium structures generally involves t… read 閱讀全文