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分類: process chemicals
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The new developer X AR 600-50/2 is highly sensitive and selective for AR-P 617, with minimal dark er… read 閱讀全文
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The article discusses the evaluation of new developer systems for the highly sensitive e-beam resist… read 閱讀全文
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Summary: For the development of AR-P 5320 positive photoresist, AR 300-26 developer is recommended, … read 閱讀全文
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Dr. Lothar Hahn from the Karlsruhe Institute of Technology assessed various developers for CSAR 62, … read 閱讀全文
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The content discusses development procedures for removing exposed areas of positive-tone resists and… read 閱讀全文
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The development cascade is recommended for optimal performance and cleanliness during immersion deve… read 閱讀全文
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The development of exposed CSAR 62 resist films is typically done through immersion development with… read 閱讀全文
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Developer AR 300-35 is recommended for structuring photoresists on alkali-sensitive substrates, such… read 閱讀全文
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The use of alkaline developers for aluminium substrates presents challenges, as some developers can … read 閱讀全文
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Aqueous-alkaline developers can age due to CO2 absorption, with buffered types being more stable tha… read 閱讀全文
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