分類: photoresist

The study at TU Braunschweig focused on the fabrication of well-defined resist architectures with ve… read 閱讀全文

The size and shape of structures in negative resists are dose-dependent, with overexposure causing w… read 閱讀全文

The content discusses the use of chemically enhanced negative resist without cross-linking in applic… read 閱讀全文

The content describes coloured negative photoresists used in the optical industry and analytics. FUJ… read 閱讀全文

The provided content discusses chemically enhanced negative resist, particularly focusing on substra… read 閱讀全文

The content discusses the process parameters and resolution of chemically enhanced negative resist A… read 閱讀全文

CAR 44 on copper is a negative photoresist that requires special attention when used on copper subst… read 閱讀全文

The novolac-based negative-tone resist offers superior stability in strongly alkaline solutions and … read 閱讀全文