分類: photoresist

Summary: Allresist offers spray resists suitable for extreme topologies, with improved surfaces and … read 閱讀全文

New aqueous-alkali soluble polymers offer high thermal stability for negative resists, preventing me… read 閱讀全文

The negative resist AR-N 4400-10 can be structured with laser exposure at 405 nm, showing arrays wit… read 閱讀全文

Summary: PMMA resist is commonly used for electron beam applications and protective coatings in wet … read 閱讀全文

This content discusses the use of NIR-laser structurable photoresists, highlighting the addition of … read 閱讀全文

The negative two-layer lift-off system offers enhanced thermal stability and distinct undercut gener… read 閱讀全文

A negative polyimide photoresist has been developed as an alternative to positive polyimide resist, … read 閱讀全文

A new high-temperature resistant negative resist, SX AR-N 4340/6, based on polyhydroxystyrene, is de… read 閱讀全文

The content describes the generation of undercut structures with negative resists using laser direct… read 閱讀全文