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resist wiki阻劑百科
分類: photoresist
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The dyed resists developed in the Photoenco project involved mixing dyes into the polymer matrix of … read 閱讀全文
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The black resist developed can disable substrate transparency while allowing structure generation, c… read 閱讀全文
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Atlas 46 S = AR-N 4600-10 and Atlas 46 R = AR-N 4650-10 are high-thickness, stable photoresists with… read 閱讀全文
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The new Atlas 46 development is suitable for nanoimprinting, creating defined nanostructures with ne… read 閱讀全文
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Aqueous negative resist based on gelatine allows for photochemical crosslinking with catalytic iron … read 閱讀全文
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The post discusses the process of obtaining alkali-stable positive resist through treatment with HMD… read 閱讀全文
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The content discusses the one-layer and two-layer lift-off processes for creating structures require… read 閱讀全文
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The post describes two procedures for manufacturing conducting paths: etching technique and lift-off… read 閱讀全文
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The content discusses various types of resists used in the fabrication process, including positive a… read 閱讀全文
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The content discusses the dilution of photo resists, particularly the use of PMA as a solvent and th… read 閱讀全文
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