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resist wiki阻劑百科
分類: photoresist
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The post discusses the positive resist SX AR-P 5900/8, known for its alkaline stability and ease of … read 閱讀全文
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The two-layer resist AR-BR 5460, with its non-light-sensitive bottom resist, has been effectively ut… read 閱讀全文
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The most widely used resists in composition are positive and negative photoresists. There are also s… read 閱讀全文
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Water-based photoresists offer an alternative to traditional organic solvent-soluble photoresists. T… read 閱讀全文
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Water-based photoresists offer an alternative to traditional organic solvent-soluble photoresists. T… read 閱讀全文
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The UV-structuring of PMMA resists can be achieved using deep UV light with exposure wavelengths of … read 閱讀全文
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A new two-layer resist system has been developed to address the challenges of hydrofluoric acid (HF)… read 閱讀全文
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The two-layer photoresist system, consisting of PMMA resist and photoresist, provides protection aga… read 閱讀全文
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The thermostable photoresists, SX AR-N 4340/6 and SX AR-P 3500/8, can withstand high temperatures up… read 閱讀全文
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The top surface imaging (TSI) photoresist utilizes selective resist silylation to create high-resolu… read 閱讀全文
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