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resist wiki阻劑百科
分類: photoresist
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The top surface imaging (TSI) photoresist technology, based on a selective resist silylation process… read 閱讀全文
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The content discusses thermostable photoresists, including negative resist SX AR-N 4340/6 and positi… read 閱讀全文
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The Resist Wiki article discusses thermally stable two-layer lift-off systems, highlighting the use … read 閱讀全文
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The content discusses the use of spray resists for different topologies and the characteristics of s… read 閱讀全文
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The content discusses resist for 488 nm exposure wavelength and its implications in the context of U… read 閱讀全文
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Two positive-tone two-layer lift-off systems, the AR-P 5400-3510 series and PMGI variant, have been … read 閱讀全文
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This content discusses the use of positive resist for temperature-sensitive substrates, especially f… read 閱讀全文
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The content discusses the challenges of coating Teflon substrates with photoresist due to their hydr… read 閱讀全文
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In the CiS Institute for Microsensors, a new spray coating procedure was developed for deep silicon … read 閱讀全文
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The content discusses laser direct exposure with AR-P 3540, a technology that allows writing structu… read 閱讀全文
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