分類: EBL resist

CSAR structures on glass The use of a combination of CS read 閱讀全文

CSAR 62 Avoidance of particles during large-area exposu read 閱讀全文

CSAR 62 lift-off for thick layers For special applicati read 閱讀全文

CSAR 62 thick layers The e-beam resist CSAR 62 has so f read 閱讀全文

Thick CSAR 62 A few applications like e.g. the manufact read 閱讀全文

Solvents in e-beam resists The beginning of electron be read 閱讀全文

Collapse of extreme high-resolution e-beam resist struc read 閱讀全文

High-resolution PMMA one layer resist Utilizing SX AR-P read 閱讀全文

Positive polyimide resist for e-beam-lithography First read 閱讀全文