分類: EBL resist

The AR-P 617 two layer lift-off system involves using a resist called AR-P 617 to create a well-defi… read 閱讀全文

T-gates with three-layer system Publication MNE 2017 T- read 閱讀全文

3-layer system CSAR/PMMA-co-MA/PMMA A further variant f read 閱讀全文

CSAR 62 – Mechanism of action By comparison with P read 閱讀全文

PMMA e-beam resist, positive and negative in the case o read 閱讀全文

PMMA e-beam resist with flat gradation for three-dimens read 閱讀全文

Temperature resistance of e-beam polymers Layers and st read 閱讀全文

CSAR 62 nanostructures written at 100 kV Applying an ac read 閱讀全文

CSAR 62 single layer lift-off system With our new devel read 閱讀全文