分類: EBL resist

The DESIRE process enables electron beam lithography, where structures are written into a resist lay… read 閱讀全文

Allresist, in collaboration with Aglycon, Joanneum Research, and SwissLitho AG, is developing high-q… read 閱讀全文

The report discusses the use of PPA for two-layer systems. It covers the development rates of AR P-6… read 閱讀全文

The University of Tübingen has conducted experiments on poly(phthalaldehyde) (PPA)-based electron be… read 閱讀全文

The content discusses the use of poly(phthalaldehyde) (PPA) as an electron beam resist for direct po… read 閱讀全文

Mr. Chi Tang has been working since 2015 at the University of California using Electra 92 for PMMA l… read 閱讀全文

The Eurostar PPA-Litho project successfully developed the resist Phoenix 81 with improved stability,… read 閱讀全文

The study assessed the long-term stability of Electra 92 by coating two reference samples on glass a… read 閱讀全文

The company Raith GmbH demonstrated that coating quartz with Electra 92 allows for accurate patterni… read 閱讀全文