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歡迎來訪
前瞻製程解決方案

nano and micro scale lithogrophy materials
微奈米微影材料

電子束微影阻劑
熱掃描微影阻劑
UV光阻劑
HF and KOH蝕刻保護塗佈
導電塗佈

lithography process chemicals
微影製程化學品

增黏劑
顯影劑
去除劑

PERR-post etching residue remover
乾蝕刻殘留濕式去除

TSV clean
MIM clean
顯影劑 TMAH 2.38% 20L
光阻去除劑－non-NMP, non-TMAH

Products and Services

lithography materials and ancillaries

微奈米微影材料

other products and applications

其它產品及應用

product sorted by process

產品以微影製程分類

new material co-development

新產品開發或代進口

Contents are base on principal’s product TDS
內容取材自原廠產品技術資料