Developer AR 300-35 for alkali-sensitive substrates

The use of aqueous-alkaline developers on alkali-sensitive substrates like aluminium is problematic, because the substrate is similarly attacked during the development step. If photoresists are to be structured on alkali-sensitive substrates, developer AR 300-35 is thus highly recommended. Even though this developer is likewise aqueous-alkaline, it does not attack aluminium surfaces due to its specific composition which passivates the substrate surface. The undiluted developer can furthermore be used as remover for such sensitive substrates.