Thermally stable two-layer lift-off systems
The Resist Wiki article “Positive two-layer lift-off systems” describes the principle of these two-layer systems. During the application of lift-off structures, temperatures above 150 °C occur frequently, for example during sputtering. If the usual photo resists are used as top layer, the lift-off structure melts and thus becomes useless for the process.
Using the thermostable positive resist SX ARP 3500/8 as top layer, however, yields a heat-resistant lift-off structure which also withstands sputtering processes. See Resist-Wiki “Negative two-layer lift-off system” and “Thermostable photo resists”.
Overview of photoresist-others
Adaptable two-layer resist AR-BR 5460 for variable lift-off structures
Alkali-stable, easily structurable positive resist SX AR-P 5900/8
Laser direct exposure with AR-P 3540
New procedure for the spray coating of deep topologies with SX AR-P 1250/20
Photoresist coatings on Teflon substrates
Positive resist for temperature sensitive substrates
Positive two- layer lift-off system
Resist for 488 nm exposure wavelength
Spray resists for different topologies (positive and negative)
Thermally stable two-layer lift-off systems
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