Photoresist coatings on Teflon substrates

Teflon or similar products are, due to their extreme surface properties, utilised for applications in which a structuring of the Teflon is sometimes desirable. The hydrophobic surface properties however impede the coating with resist, since the resist which was spin-deposited retracts towards the middle of the substrate. It is nevertheless possible to coat also Teflon substrates, if a modified photoresist of the AR-P 3200 series is used. The properties of this resist were adjusted accordingly by varying the surface tension and an addition of adhesion promoter.