Resist composition-general

The resists most widely used by far are the positive photo resists, followed by negative photo resists. However, there are other special resists as well.

Image reversal resists are positive resists with an additional amine. Depending on the manufacturing process, positive or negative images can be generated. Moreover, there are special resists such as the positive polyimide resists and negative polyimide resists (high temperature application > 400 °C, polymer polyimide), negative polyhydroxystyrene resists (high temperature application > 300 °C), negative PMMA photo resists (non-aqueous development for sensitive substrates, polymer PMMA and cross-linker), positive and negative two-layer photo resists (lift-off technology, polymer copolymer PMMA).