Ethanol and toluene-resistant photoresist AR-U 4060

Structures of the image reversal resist AR-U 4060 show an increased resistance against organic solvents after flood exposure with subsequent tempering. Ethanol and toluene attack normal positive resist layers quickly, which are consequently dissolved in short time. If AR-U 4060 is flood exposed after patterning (2 minutes) and tempered at 110 °C, the structures remain stable for several hours or even over night after a tempering at 120 °C. The same effect can be obtained in ethanol by flood exposure for 5 minutes and tempering at 150 °C. The surface remains unscathed over night. Removal is in this case possible with remover AR 300-73.