What are the adhesion features of photoresists on different wafers?
Adhesion between coating and substrates is a very sensitive issue. Smallest changes of the cleaning procedures or the process parameters can have a fatal impact on the adhesive strength. Silica, silicon nitride, and base metals (such as aluminium, copper) generally exhibit good resist adhesion properties, while adhesion is reduced on SiO2, glass, noble metals such as gold and silver, as well as on gallium arsenide. For the last-mentioned substrates, adhesion promoters are absolutely required to improve the adhesion strength ( Question 4: Optimal pre-treatment of substrates). If the air humidity is too high (> 60 %), adhesion is also substantially reduced.
Overview of photoresist FAQs
1. What are photoresists composed of, and how do they work?
2. For how long are photoresists stable, and what are the optimal storage conditions?
3. How may age-related changes influence the quality of a photoresist?
4. What is the optimal pre-treatment of substrates for photoresists?
5. What are the adhesion features of photoresists on different wafers?
6. What are the optimum coating parameters for photoresists in order to achieve good film images?
7. Why may air bubbles develop in photoresist films, and how can they be avoided?
8. What is the function of the softbake of photoresist films after the coating?
11. How can resist coatings be removed again?
12. What is the application range of protective coatings?
13. How do image reversal resists work?
14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?
15. How can thick films of > 10 µm be processed in an optimal way?
16. Which resolution and which contrast can be obtained with photoresists?
17. How high is the plasma etch resistance of photoresists?
18. How high is the etch resistance of photoresist in the presence of strong acids?
19. Which photoresists are suitable for hydrofluoric acid (HF) etching?
20. How high is the solvent resistance of photoresist films?