For how long are photoresists stable, and what are the optimal storage conditions?
Photoresists are light-sensitive, they are affected by light exposure and high temperatures, and also age-related changes occur during storage. Resists are therefore filled in light-protected amber glass bottles, stored in a cool place, and may only be processed under yellow safe light (λ > 500 nm). Date of expiry and recommended storage temperature are indicated on the product label of each bottle. Following these recommended storage guidelines, resists are stable until expiry date, at least however for 6 month after date of sale. Short-term temperatures deviations have no influence on general product properties.
If resists are to be used later than 6 month after date of sale or are processed within a very small process window, storage at 4 – 8 °C is recommended. Exceptions are only resists with recommended storage temperatures between 18 – 25 °C. These resists should not be stored cooler. Photoresists stored for several years are outdated and may only be used with considerable restrictions (see also Question 3.).
Bottles which were kept in the refrigerator should never be opened immediately, since in this case air moisture may precipitate on the cold resist. Resists should be adapted to room temperature before opening.
Overview of photoresist FAQs
1. What are photoresists composed of, and how do they work?
2. For how long are photoresists stable, and what are the optimal storage conditions?
3. How may age-related changes influence the quality of a photoresist?
4. What is the optimal pre-treatment of substrates for photoresists?
5. What are the adhesion features of photoresists on different wafers?
6. What are the optimum coating parameters for photoresists in order to achieve good film images?
7. Why may air bubbles develop in photoresist films, and how can they be avoided?
8. What is the function of the softbake of photoresist films after the coating?
11. How can resist coatings be removed again?
12. What is the application range of protective coatings?
13. How do image reversal resists work?
14. How can undercut patterns (lift-off structures) be produced in one- or two layer systems?
15. How can thick films of > 10 µm be processed in an optimal way?
16. Which resolution and which contrast can be obtained with photoresists?
17. How high is the plasma etch resistance of photoresists?
18. How high is the etch resistance of photoresist in the presence of strong acids?
19. Which photoresists are suitable for hydrofluoric acid (HF) etching?
20. How high is the solvent resistance of photoresist films?