Coloured negative photoresists
Coloured resist structures are mainly required in optical industry and in analytics. FUJIFILM offers red, blue and green coloured acrylate-based negative resists. These resists however contain colour pigments with a size of a few hundred nm, which limits resolution and edge sharpness. In addition, organic solvents have to be used as developers.

Figure 1: Colour filter array with coloured negative resists
Allresist now also offers colored negative resists with the designation SX AR-N 8350. The difference to FUJIFILM resists is that only dyes and no pigments are dissolved in the resists. This allows to achieve a high resolution and high edge sharpness. Since here a slightly modified negative resist is used as the base resist for „normal“ photolithography, development is possible with common aqueous alkaline developers.

Figure 2: AR logo in different colours

Overview of negative photoresist
Alkali-stable and solvent-stable negative resist
Chemically enhanced negative resist (Process parameters and resolution)
Chemically enhanced negative resist without cross-linking
Coloured negative photoresists
Development of thick negative resist layer
Dose-dependent structure size with negative resists
Fabrication of vertical flanks with CAR 44
Generation of undercut structures with negative resists
Negative polyimide photoresist
Negative two- layer lift-off system
NIR-laser structurable photoresists
poly(hydroxystyrene) and (hydroxystyrene-co-MMA) photoresist with high-temperature stability
Sensitive negative PMMA resist (CAR)
Sensitive negative resist for 405 nm laser direct exposure