Positive polyimide resist for e-beam-lithography
First experiments with our SX AR-P 5000/82.7 using e-beam lithography clearly demonstrated that this resist can easily be patterned which offers the possibility to generate nanostructures which are thermally stable up to 350 °C. Processing of our polyimide-resist is quite simple, since this resist requires no bake after coating (curing-process) and can be developed in aqueous-alkaline solutions.
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