CSAR structures on glass
The use of a combination of CSAR 62 and the conductive coating Electra 92 in e-beam lithography allows the manufacture of highly complex structures on insulating glass or semi-insulating substrates such as e.g. gallium arsenide. The very high sensitivity and the highest achievable resolution of CSAR 62 are harmoniously complemented by the good conductive properties of Electra 92.
30 – 150 nm squares of CSAR 62 on glass
Related articles EBL positive
CSAR 62 related
3-layer system CSAR/PMMAcoMA/PMMA
3-layer system for T-gate CSAR/PMMAcoMA/PMMA
BOE etching of SiO2 with CSAR 62 mask
Collapse of extreme high-resolution e-beam resist structures
CSAR 62 Avoidance of particles during large-area exposures
CSAR 62 – Development at low temperatures
CSAR 62 – Experimental studies on new, sensitive developers
CSAR 62 lift-off for thick layers
CSAR 62 nanostructures written at 100 kV
CSAR 62 single layer lift-off system
Evaluation of various developers for e-beam exposed CSAR 62 layers (100 kV)
HF etching of GaAs with CSAR 62 masks
Manufacture of plasmonic nanostructures with CSAR 62
Use of CSAR 62 for the manufacture of nanostructures on GaAs substrates
Techpoint 久理企業 